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Based on years of in-depth research and development and preparation capabilities in the synthesis of quartz and heat treatment processes for fiber optic preforms,And with a comprehensive optical detection platform, Changfei Quartz Company's YS series high-quality synthetic quartz glass can meet the needs of cutting-edge optical applications.
Changfei Quartz Company has various quartz glass preparation processes, including high-purity synthetic quartz, natural fused quartz ingots, fused quartz cylinders, etc., to meet various applications in the semiconductor market.
Changfei Quartz Company produces high-quality synthetic quartz tubes, quartz rods, quartz tubes, and other products based on its independent CVD synthesis process, combined with various purification and doping technologies.
Metal impurity content<50ppb
Hydroxyl group<250ppm, metal impurity content<50ppb, customizable size, light uniformity, and stress birefringence
Hydroxyl group<250ppm, metal impurity content<50ppb, light average NS, stress birefringence<5nm/cm
Hydroxyl group<250ppm, metal impurity content<100ppb
High purity synthetic quartz glass with low hydroxyl content (OH<250ppm), possessing optical properties such as 3D stripe free, high optical uniformity, and low stress birefringence.
Using imported natural quartz sand and electric melting process, we provide high-purity, low bubble rate, and low OH content quartz materials for semiconductors
采用进口天然石英砂，通过等离子工艺，提供高纯度、低气泡率、低OH含量的半导体用石英材料
Has high transmittance, extremely low metal impurity content, and high processing accuracy
Based on high-purity synthetic quartz materials, YSM series masks have extremely high transmittance, low impurity content, and high surface quality.
Opaque quartz has excellent thermal insulation properties and can be applied to components with insulation properties in fields such as semiconductors and photovoltaics.
It has an extremely low coefficient of thermal expansion and excellent mechanical properties, and can be applied to interferometer reference mirrors, aerospace reflectors, EUV lithography lenses, and lithography stages.
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