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optical performance

• ppb purity, hydroxyl content<250ppm, ensuring good optical transmittance

• ArF 193nm > 90.2%

•KrF 248nm > 92%

• I-line 365nm > 92.5%

•g-line 436nm > 92.7%

Internal transmittance ≥ 99.5%/cm @ 193nm

Ensure good stress control and optical uniformity through preparation and processing techniques

Optical Transmittance Performance

Processing indicators

Capable of processing and testing quartz substrates for semiconductor masks

Multi line cutting

Double sided grinding and polishing

Ultrasonic cleaning, deep cleaning

• Defect detection

• Uniformity

Typical test values (test method: atomic force microscope)

Surface roughness test (10)μm*10μm）